Peer Review History: Comparative Study of Four-Point Measurements of Copper Thin Films Resistivity in Aligned and Square Configuration at Low Frequencies

Editor(s):

(1) Dr.  David Armando Contreras-Solorio, Professor, Academic Unit of Science and Technology of Light and Matter, Autonomous University of Zacatecas, Mexico.

Reviewers:

(1) Okoli Nonso Livinus, Legacy University Okija, Nigeria.

(2) Avula Edukondalu, University  Post Graduate College, Osmania University, India.

Additional Reviewers:

 

Open Peer Review Policy: Click Here

Specific Comment:

Average Peer review marks at initial stage: 8.25/10

Average Peer review marks at publication stage: 9/10

Peer Review History:


Stage 1 | Original Manuscript | File 1 | NA


Stage 2 | Peer review report_1 (Okoli Nonso Livinus, Nigeria) | File 1 | NA


Stage 2 | Peer review report_2 (Avula Edukondalu, India) | File 1 | NA


Stage 2 | Revised_MS_v1_and_Feedback_v1 | File 1 | File 2


Stage 3 | Comment_Editor_1_v1 | File 1 | NA


Stage 3 | Revised_MS_v2_and_Feedback_v2 | File 1 | NA


Posted in Review History.